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Single wafer spin cleaning machine×LC 洗浄装置事業部 - List of Manufacturers, Suppliers, Companies and Products

Single wafer spin cleaning machine Product List

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Single-leaf spin cleaning device

Accommodating various process needs with a diverse range of chamber forms! Work sizes range from 2-inch to 12-inch wafers.

The "Sheet-type Spin Cleaning Device" can be equipped with ultrasonic spray nozzles, two-fluid spray nozzles, high-pressure jet nozzles, ozone water, and more, allowing for processing tailored to specific applications. It accommodates work sizes from 2-inch to 12-inch wafers. It can also handle square substrates up to 500mm on a side (consultation required). The device can be configured with process modules for acidic, alkaline, and organic solutions. 【Features】 ■ Versatile chamber configurations to meet various process needs ■ Compatible with work sizes from 2-inch to 12-inch wafers ■ Can also accommodate square substrates up to 500mm on a side (consultation required) ■ Configurable with process modules for acidic, alkaline, and organic solutions *For more details, please download the PDF or feel free to contact us.

  • Other surface treatment equipment
  • Other semiconductor manufacturing equipment

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